Invention Grant
- Patent Title: Light intensity modulation method
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Application No.: US16090032Application Date: 2017-03-30
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Publication No.: US10416568B2Publication Date: 2019-09-17
- Inventor: Pengchuan Ma , Yiqiang Tian
- Applicant: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Applicant Address: CN Shanghai
- Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.
- Current Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.
- Current Assignee Address: CN Shanghai
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: CN201610200470 20160331
- International Application: PCT/CN2017/078717 WO 20170330
- International Announcement: WO2017/167211 WO 20171005
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A light intensity modulation method implemented by using a mask (101) includes the steps of: 1) based on a circle of confusion (CoC) function of an illumination system (102), an initial light intensity distribution of an illumination field of view (FOV) and a target light intensity distribution of the illumination FOV, calculating a transmittance distribution of the mask (101) used to modulate the initial light intensity distribution into the target light intensity distribution; 2) meshing the mask (101) according to a desired accuracy of the target light intensity distribution and determining a distribution of opaque dots in each of cells resulting from the meshing based on the transmittance distribution of the mask (101) and a desired accuracy of the transmittance distribution; and 3) fabricating the mask (101) based on the determined distribution of the opaque dots and then deploying the mask (101) in the illumination system. Advantages including a high modulation accuracy, an applicability to wide FOV size, light intensity and wavelength ranges and compatibility with established manufacturing processes can be attained.
Public/Granted literature
- US20190113850A1 LIGHT INTENSITY MODULATION METHOD Public/Granted day:2019-04-18
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