Invention Grant
- Patent Title: Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
-
Application No.: US15208334Application Date: 2016-07-12
-
Publication No.: US10418247B2Publication Date: 2019-09-17
- Inventor: Krishna P. Murella , Hongjun Zhou , Dnyanesh Chandrakant Tamboli
- Applicant: Air Products and Chemicals, Inc.
- Applicant Address: US AZ Tempe
- Assignee: VERSUM MATERIALS US, LLC
- Current Assignee: VERSUM MATERIALS US, LLC
- Current Assignee Address: US AZ Tempe
- Agent Lina Yang
- Main IPC: H01L21/306
- IPC: H01L21/306 ; C09G1/02 ; H01L21/3105 ; C09K3/14
Abstract:
Polishing compositions comprising ceria coated silica particles offer minimal topography, reduced oxide and nitride losses, while providing high oxide polish rates. These formulations are especially useful for polishing large structures typically used in 3D NAND device manufacturing.
Public/Granted literature
- US20170133236A1 Composite Abrasive Particles For Chemical Mechanical Planarization Composition And Method Of Use Thereof Public/Granted day:2017-05-11
Information query
IPC分类:
