Invention Grant
- Patent Title: Semiconductor device and manufacturing method
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Application No.: US15390683Application Date: 2016-12-26
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Publication No.: US10418359B2Publication Date: 2019-09-17
- Inventor: Naoyuki Kanai , Motohito Hori , Satoshi Kaneko
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP2016-027946 20160217
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L27/06 ; H01L21/56 ; H01L23/31 ; H01L29/06 ; H01L29/66 ; H01L29/739 ; H01L29/872 ; H01L25/065 ; H01L23/24 ; H01L23/00 ; H01L23/049

Abstract:
A semiconductor device 100 includes a semiconductor element 12 having an electrode on a front surface, a wire 15 bonded to the electrode of the semiconductor element 12, a resin layer 22b covering a bonding portion of the wire 15 on the front surface of the semiconductor element 12, and a gel filler material 23 that seals the semiconductor element 12, the wire 15, and the resin layer 22b. By protecting the bonding portion of the wire 15 with the resin layer 22b, degradation of the wire 15 is ameliorated and the reliability of the semiconductor device 100 is improved.
Public/Granted literature
- US20170236819A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD Public/Granted day:2017-08-17
Information query
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