Invention Grant
- Patent Title: Processing device
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Application No.: US15777833Application Date: 2016-11-28
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Publication No.: US10421172B2Publication Date: 2019-09-24
- Inventor: Makoto Shimoda , Masaki Kanazawa
- Applicant: TOKYO SEIMITSU CO., LTD
- Applicant Address: JP Tokyo
- Assignee: Tokyo Seimitsu Co. LTD.
- Current Assignee: Tokyo Seimitsu Co. LTD.
- Current Assignee Address: JP Tokyo
- Agency: Fattibene and Fattibene LLC
- Agent Paul A. Fattibene
- Priority: JP2015-235201 20151201
- International Application: PCT/JP2016/085119 WO 20161128
- International Announcement: WO2017/094646 WO 20170608
- Main IPC: B24B37/04
- IPC: B24B37/04 ; B24B7/04 ; B24B7/22 ; B24B41/02 ; B24B41/047 ; B24B27/00 ; B24B37/30 ; B24B47/14 ; H01L21/67 ; H01L21/02

Abstract:
[Problem] To provide a processing device for grinding by suppressing brittle-mode grinding and stabilizing a wafer. [Solution] A processing device 1 is provided with: an index table 2 on which a wafer W is moved from a coarse grinding stage S2 to a fine grinding stage S3; a column 4 provided so as to span over the coarse grinding stage S2 and the fine grinding stage S3; a coarse grinding means 5 provided on the column 4 above the coarse grinding stage S2, the coarse grinding means 5 performing coarse-grinding processing on the wafer W; and a fine grinding means 6 provided on the column 4 over the fine grinding stage S3, the fine grinding means 6 performing fine-grinding processing on the wafer W.
Public/Granted literature
- US20180345439A1 PROCESSING DEVICE Public/Granted day:2018-12-06
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