Invention Grant
- Patent Title: Stream flow sparger for electroless nickel plating
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Application No.: US15161002Application Date: 2016-05-20
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Publication No.: US10422039B2Publication Date: 2019-09-24
- Inventor: Boon Kuan Chin , James Tephon Anak Goel
- Applicant: SEAGATE TECHNOLOGY LLC
- Applicant Address: US CA Cupertino
- Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee Address: US CA Cupertino
- Agency: Holland & Hart LLP
- Main IPC: C23C18/32
- IPC: C23C18/32 ; B05C3/04 ; C23C18/16

Abstract:
Systems and methods for nickel plating include providing a tank that retains a plating bath into which a substrate is submerged, and creating a horizontal flow of processing solution in the plating bath to assist in carrying contaminants out of the plating bath. A sparger box may be positioned in the tank to deliver the processing solution into the plating bath in a horizontal direction. The processing solution, which carries the contaminants, may exit the plating bath through a plate member that includes a plurality of orifices and is also positioned in the tank. The orifices may have a variable opening size to help control outflow of the processing solution.
Public/Granted literature
- US20170335463A1 STREAM FLOW SPARGER FOR ELECTROLESS NICKEL PLATING Public/Granted day:2017-11-23
Information query
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