Invention Grant
- Patent Title: Substrate for surfaced enhanced raman scattering, fabrication method for the same and analyzing method using the same
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Application No.: US14947960Application Date: 2015-11-20
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Publication No.: US10422752B2Publication Date: 2019-09-24
- Inventor: Dong Ho Kim , Sung Gyu Park , Chang Su Kim
- Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS
- Applicant Address: KR Daejeon
- Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
- Current Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
- Current Assignee Address: KR Daejeon
- Agency: Moore & Van Allen PLLC
- Agent Henry B. Ward, III
- Priority: KR10-2014-0163737 20141121
- Main IPC: B82Y15/00
- IPC: B82Y15/00 ; G01N21/65 ; B82Y30/00 ; B82Y20/00

Abstract:
The present disclosure relates to a substrate for surface enhanced Raman scattering, a fabricating method for the same and an analyzing method using the same. The present disclosure may provide a substrate for surface enhanced Raman scattering having excellent surface enhanced Raman scattering effects by randomly stacking of Ag nanowires in a simple way by utilizing a substrate having a filtering function, and a method for efficiently analyzing a material to be analyzed using the same.
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