Invention Grant
- Patent Title: Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate
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Application No.: US15450577Application Date: 2017-03-06
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Publication No.: US10423083B2Publication Date: 2019-09-24
- Inventor: Kentaro Harada , Goji Wakamatsu
- Applicant: JSR Corporation
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G03F1/60
- IPC: G03F1/60 ; G03F7/00 ; H01L21/02 ; G03F7/20 ; B01D15/00 ; B01J20/26
Abstract:
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.
Public/Granted literature
- US20170176878A1 CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE Public/Granted day:2017-06-22
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