Invention Grant
- Patent Title: Coil, inductor device and method for manufacturing the coil
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Application No.: US15264585Application Date: 2016-09-13
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Publication No.: US10424431B2Publication Date: 2019-09-24
- Inventor: Raphaël Jacques Valentin
- Applicant: Xytech Electronic Technology (Shanghai) Co., Ltd.
- Applicant Address: CN Shanghai
- Assignee: XYTECH ELECTRONIC TECHNOLOGY (SHANGHAI) CO., LTD.
- Current Assignee: XYTECH ELECTRONIC TECHNOLOGY (SHANGHAI) CO., LTD.
- Current Assignee Address: CN Shanghai
- Agency: Perkins Coie LLP
- Priority: CN201510587257 20150915
- Main IPC: H01F27/29
- IPC: H01F27/29 ; H01F27/28 ; H01F41/04 ; H01L49/02 ; H05K1/16

Abstract:
A coil comprises a plurality of conductive layers, wherein a first conductive layer and a second conductive layer of the plurality of conductive layers each comprises a winding, and the first conductive layer is adjacent to the second conductive layer; wherein a first winding on the first conductive layer is electrically connected to a second winding on the second conductive layer, a first end of the first winding is connected to a first terminal electrode, and a second end on the second winding is connected to a second terminal electrode; wherein geometric central points of the first winding and the second winding are not spatially aligned.
Public/Granted literature
- US20170076853A1 COIL, INDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE COIL Public/Granted day:2017-03-16
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