Invention Grant
- Patent Title: Apparatus, method and non-transitory storage medium for accommodating and processing a substrate
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Application No.: US15450431Application Date: 2017-03-06
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Publication No.: US10424499B2Publication Date: 2019-09-24
- Inventor: Akihiro Matsumoto , Michiaki Matsushita , Satoru Shinto , Kazunori Kuratomi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2013-004382 20130115
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67
Abstract:
A substrate accommodating and processing apparatus is provided with a cassette mounting table, a processing part, a substrate transfer mechanism, a partition wall, a cassette stage, and a lid attaching/detaching mechanism. The lid attaching/detaching mechanism is provided with a key configured to be engaged with a key hole installed in the lid, and configured to switch a latch between locking and unlocking positions. The mechanism is also provided with a lid abnormality detecting sensor, a lid attaching/detaching mechanism closing sensor, a lid attaching/detaching mechanism opening sensor, a pressure sensor and a control part.
Public/Granted literature
- US20170178941A1 APPARATUS, METHOD AND NON-TRANSITORY STORAGE MEDIUM FOR ACCOMODATING AND PROCESSING A SUBSTRATE Public/Granted day:2017-06-22
Information query
IPC分类:
