Invention Grant
- Patent Title: Glass composite for use in extreme ultra violet lithography
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Application No.: US15559958Application Date: 2016-03-22
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Publication No.: US10427974B2Publication Date: 2019-10-01
- Inventor: Sezhian Annamalai
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: CORNING INCORPORATED
- Current Assignee: CORNING INCORPORATED
- Current Assignee Address: US NY Corning
- International Application: PCT/US2016/023557 WO 20160322
- International Announcement: WO2016/154190 WO 20160929
- Main IPC: B32B17/06
- IPC: B32B17/06 ; C03C10/00 ; C03C3/06 ; C03C27/06 ; C03B23/203 ; G02B5/08 ; C03B19/06 ; C03B32/02 ; B32B5/16 ; B32B5/30 ; B32B7/04 ; B32B3/28 ; B32B37/04 ; C03C3/076 ; G03F1/60 ; G02B1/00
Abstract:
A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.
Public/Granted literature
- US20180105452A1 GLASS COMPOSITE FOR USE IN EXTREME ULTRA VIOLET LITHOGRAPHY Public/Granted day:2018-04-19
Information query
