Invention Grant
- Patent Title: Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby
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Application No.: US15743944Application Date: 2016-08-04
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Publication No.: US10428415B2Publication Date: 2019-10-01
- Inventor: Jong-Kab Park , Bo-Ram Kim , Jun-Gyu Hur , Doh-Hoon Kim
- Applicant: AP SYSTEMS INC.
- Applicant Address: KR
- Assignee: AP SYSTEMS INC.
- Current Assignee: AP SYSTEMS INC.
- Current Assignee Address: KR
- Agency: Mendelsohn Dunleavy, P.C.
- Priority: KR10-2015-0112608 20150810
- International Application: PCT/KR2016/008598 WO 20160804
- International Announcement: WO2017/026741 WO 20170216
- Main IPC: C23C14/04
- IPC: C23C14/04 ; H01L21/027 ; H01L21/033 ; G03F7/095 ; G03F7/12 ; B23K26/352 ; H01L21/31 ; H01L51/00

Abstract:
The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a wet-etched pattern by performing wet etching from above a base; and forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.
Public/Granted literature
- US20180202035A1 METHOD OF MANUFACTURING SHADOW MASK USING HYBRID PROCESSING AND SHADOW MASK MANUFACTURED THEREBY Public/Granted day:2018-07-19
Information query
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