Invention Grant
- Patent Title: System, method and apparatus for controlling the flow direction, flow rate and temperature of solids
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Application No.: US15086821Application Date: 2016-03-31
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Publication No.: US10429064B2Publication Date: 2019-10-01
- Inventor: Jonq-Hai Chiu , Herbert E. Andrus, Jr. , Christoph Herbert Weingaertner , Hans-Peter Dornik , Olaf Stallmann
- Applicant: GENERAL ELECTRIC TECHNOLOGY GMBH
- Applicant Address: CH Baden
- Assignee: GENERAL ELECTRIC TECHNOLOGY GMBH
- Current Assignee: GENERAL ELECTRIC TECHNOLOGY GMBH
- Current Assignee Address: CH Baden
- Agency: Grogan, Tuccillo & Vanderleeden, LLP
- Main IPC: F23C10/28
- IPC: F23C10/28 ; F23C10/22 ; F23C10/20 ; F23C10/26 ; F23C10/10 ; F23C10/00 ; B01J8/18 ; B01J8/36 ; B01J8/00 ; B01J8/38

Abstract:
An apparatus for controlling flow of a material includes an inlet for receiving the material from a source, and a seal mechanism connected to the inlet, the seal mechanism having a fluidizing bed configured to receive the material from the inlet, a first discharge passageway and a second discharge passageway. The fluidizing bed includes a first transport zone associated with the first discharge passageway and a second transport zone associated with the second discharge passageway, wherein the first and second transport zones are configured to receive transport gas from a transport gas source. The transport gas is controllable to selectively divert a flow of the material into the first discharge passageway and the second discharge passageway.
Public/Granted literature
- US20170284660A1 SYSTEM, METHOD AND APPARATUS FOR CONTROLLING THE FLOW DIRECTION, FLOW RATE AND TEMPERATURE OF SOLIDS Public/Granted day:2017-10-05
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