Invention Grant
- Patent Title: Defect detection method and defect detection device
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Application No.: US16004966Application Date: 2018-06-11
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Publication No.: US10429172B2Publication Date: 2019-10-01
- Inventor: Takahide Hatahori , Yuya Nagata , Kenji Takubo
- Applicant: SHIMADZU CORPORATION
- Applicant Address: JP Kyoto-shi, Kyoto
- Assignee: SHIMADZU CORPORATION
- Current Assignee: SHIMADZU CORPORATION
- Current Assignee Address: JP Kyoto-shi, Kyoto
- Agency: Sughrue Mion, PLLC
- Priority: JP2017-115398 20170612
- Main IPC: G01N21/45
- IPC: G01N21/45 ; G01B9/02 ; G01N29/00

Abstract:
A defect detection method includes the following processes: a) stroboscopically illuminating the entire surface of an object within an examination area of the object while inducing a first elastic wave across the examination area on the object, and controlling the phase of the elastic wave and the timing of the stroboscopic illumination to collectively measure a back-and-forth displacement of each point within the examination area in at least three phases of the elastic wave; b) identifying a surface location which is the location of a defect on the examination area, based on the back-and-forth displacement of each point within the examination area in the at least three different phases; and c) injecting a second elastic wave into a region inside the surface location from a limited area including the surface location, and determining the location and/or size in the depth direction of the defect, based on a response wave.
Public/Granted literature
- US20180356205A1 DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE Public/Granted day:2018-12-13
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