Invention Grant
- Patent Title: Interferometric method for measuring a size of particle in the presence of a gap
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Application No.: US15114667Application Date: 2015-01-28
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Publication No.: US10429287B2Publication Date: 2019-10-01
- Inventor: Makoto Kawano , Hitoshi Watarai , Nobutoshi Ota
- Applicant: OSAKA UNIVERSITY
- Applicant Address: JP Osaka
- Assignee: OSAKA UNIVERSITY
- Current Assignee: OSAKA UNIVERSITY
- Current Assignee Address: JP Osaka
- Agency: Studebaker & Brackett PC
- Priority: JP2014-013161 20140128
- International Application: PCT/JP2015/052334 WO 20150128
- International Announcement: WO2015/115471 WO 20150806
- Main IPC: G01N15/02
- IPC: G01N15/02 ; G01J9/02 ; G02F1/21 ; G01N15/00

Abstract:
An observation apparatus (100) includes an observing optical system (101) capable of obtaining an image of a measurement target present in a gap included in a device (1). One end of the gap included in the device (1) is wider than the other end thereof, and upon light beam irradiation to the device (1), an interference fringe appears in the gap. The observing optical system (101) irradiates the gap included in the device (1) with a plurality of light beams having different wavelengths to cause a plurality of interference fringes to appear in the gap. Then the observing optical system (101) obtains an image of the plurality of interference fringes.
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