Invention Grant
- Patent Title: EUV radiation modification methods and systems
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Application No.: US15883234Application Date: 2018-01-30
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Publication No.: US10429729B2Publication Date: 2019-10-01
- Inventor: Chun-Lin Louis Chang , Jen-Hao Yeh , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F7/20 ; H01L21/027 ; H05G2/00

Abstract:
A method and system for generating EUV light includes providing a laser beam having a Gaussian distribution. This laser beam can be then modified from a Gaussian distribution to a ring-like distribution. The modified laser beam is provided through an aperture in a collector and interfaces with a moving droplet target, which generates an extreme ultraviolet (EUV) wavelength light. The generated EUV wavelength light is provided to the collector away from the aperture. In some embodiments, a mask element may also be used to modify the laser beam to a shape.
Public/Granted literature
- US20180314145A1 EUV RADIATION MODIFICATION METHODS AND SYSTEMS Public/Granted day:2018-11-01
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