Invention Grant
- Patent Title: Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced
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Application No.: US15724591Application Date: 2017-10-04
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Publication No.: US10429735B2Publication Date: 2019-10-01
- Inventor: Ryoji Watanabe
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2016-198451 20161006
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C08L71/02 ; C08F8/14 ; G03F7/00 ; G03F7/40 ; H01L21/02 ; H01L21/027 ; H01L21/302 ; H01L21/311
Abstract:
A coating agent capable of favorably reducing the roughness of a resist pattern, and a method for forming a resist pattern in which roughness is reduced. The method includes coating the resist pattern with the coating agent. The coating agent is a composition including a resin, an amine compound, and a solvent, the amine compound having an aliphatic hydrocarbon group having 8 to 20 carbon atoms and having 1 or more unsaturated double bond and a group having a specific amount of ethylene oxide and/or propylene oxide added thereto.
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Information query
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