Invention Grant
- Patent Title: RFIC device and method of fabricating same
-
Application No.: US15949310Application Date: 2018-04-10
-
Publication No.: US10431518B2Publication Date: 2019-10-01
- Inventor: Xiaochuan Wang
- Applicant: NINGBO SEMICONDUCTOR INTERNATIONAL CORPORATION
- Applicant Address: CN Ningbo
- Assignee: NINGBO SEMICONDUCTOR INTERNATIONAL CORPORATION
- Current Assignee: NINGBO SEMICONDUCTOR INTERNATIONAL CORPORATION
- Current Assignee Address: CN Ningbo
- Agency: Anova Law Group, PLLC
- Priority: CN201710322135 20170509
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L27/12 ; H01L21/48 ; H01L21/84 ; H01L23/66 ; H01L23/373

Abstract:
A radio frequency integrated circuit (RFIC) device and a method for fabricating same are disclosed. The RFIC device includes: a first semiconductor layer having a first surface, a second surface and a thickness of smaller than 3 μm; a first dielectric layer on the first surface of the first semiconductor layer; a semiconductor component within the first semiconductor layer and the first dielectric layer; a second dielectric layer on the second surface of the first semiconductor layer, the second dielectric layer having a thickness of smaller than 1 μm; and a sheet-like heat sink that is formed on the surface of the second dielectric layer opposite to the first semiconductor layer for dissipating heat from the semiconductor component. Efficient dissipation of heat from an RF transistor to a certain extent can be achieved by the RFIC device.
Public/Granted literature
- US20180331010A1 RFIC DEVICE AND METHOD OF FABRICATING SAME Public/Granted day:2018-11-15
Information query
IPC分类: