Invention Grant
- Patent Title: Magnetic memory devices and methods for manufacturing the same
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Application No.: US15471241Application Date: 2017-03-28
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Publication No.: US10431627B2Publication Date: 2019-10-01
- Inventor: Jae Hoon Kim , Juhyun Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2016-0099531 20160804
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L27/22 ; G11C11/16 ; H01L43/02 ; H01L43/08 ; H01L43/10 ; H01L43/12

Abstract:
A magnetic memory device is provided including a magnetic tunnel junction pattern having a free pattern, a reference pattern, and a tunnel barrier pattern between the free pattern and the reference pattern. The free pattern includes a first sub-free pattern, a second sub-free pattern, and a third sub-free pattern. The first sub-free pattern is between the tunnel barrier pattern and the third sub-free pattern, and the second sub-free pattern is between the first sub-free pattern and the third sub-free pattern. The second sub-free pattern includes nickel-cobalt-iron-boron (NiCoFeB), and the third sub-free pattern includes nickel-iron-boron (NiFeB). Related methods of fabrication are also provided.
Public/Granted literature
- US20180040667A1 Magnetic Memory Devices and Methods for Manufacturing the Same Public/Granted day:2018-02-08
Information query
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