Invention Grant
- Patent Title: Semiconductor crystal substrate with Fe doping
-
Application No.: US15687814Application Date: 2017-08-28
-
Publication No.: US10431656B2Publication Date: 2019-10-01
- Inventor: Tetsuro Ishiguro , Atsushi Yamada , Junji Kotani , Norikazu Nakamura
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Agency: Fujitsu Patent Center
- Priority: JP2016-173415 20160906
- Main IPC: H01L29/207
- IPC: H01L29/207 ; H01L29/20 ; H01L29/66 ; H01L29/778

Abstract:
A semiconductor crystal substrate includes a first buffer layer formed of a nitride semiconductor over a substrate, a second buffer layer formed of a nitride semiconductor on the first buffer layer, a first semiconductor layer formed of a nitride semiconductor on or over the second buffer layer, and a second semiconductor layer formed of a nitride semiconductor on the first semiconductor layer. The Fe concentration of the first buffer layer is higher than the C concentration of the first buffer layer. The C concentration of the second buffer layer is higher than the Fe concentration of the second buffer layer.
Public/Granted literature
- US20180069086A1 SEMICONDUCTOR CRYSTAL SUBSTRATE AND SEMICONDUCTOR DEVICE Public/Granted day:2018-03-08
Information query
IPC分类: