Invention Grant
- Patent Title: Light emitting diode and fabrication method thereof
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Application No.: US15870236Application Date: 2018-01-12
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Publication No.: US10431716B2Publication Date: 2019-10-01
- Inventor: Liming Shu , Da-qian Ye , Liangjun Wang , Xiaofeng Liu , Chaoyu Wu , Duxiang Wang , Dongyan Zhang , Sha-sha Chen
- Applicant: XIAMEN SAN'AN OPTOELECTRONICS CO., LTD.
- Applicant Address: CN Xiamen
- Assignee: XIAMEN SAN'AN OPTOELECTRONICS CO., LTD.
- Current Assignee: XIAMEN SAN'AN OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Xiamen
- Agency: Syncoda LLC
- Agent Feng Ma
- Priority: CN201610267717 20160427
- Main IPC: H01L33/02
- IPC: H01L33/02 ; H01L33/08 ; H01L33/32 ; H01L33/00 ; H01L33/14 ; H01L33/24

Abstract:
A light-emitting diode includes a first-type nitride region, a light-emitting region and a second-type nitride region, wherein the first-type nitride region includes a plurality of alternating first nitride layers and second nitride layers. The second nitride layers have high-doped emitting points pointing to the corresponding first nitride layer. The second-type nitride region includes a plurality of alternating third nitride layers and fourth nitride layers, wherein doping concentration of the fourth nitride layer is higher than that of the third nitride layer, and the fourth nitride layer has high-doped emitting points pointing to the third nitride layer. By adjusting thickness of the second nitride layer and the fourth nitride layer in different growth cycles, and density and form of corresponding emitting points, horizontal expansion of current in the first-type nitride region and the second-type nitride region can be greatly enhanced through alternating emitting points, thereby improving LED performance.
Public/Granted literature
- US20180138361A1 Light Emitting Diode and Fabrication Method Thereof Public/Granted day:2018-05-17
Information query
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