Invention Grant
- Patent Title: Maintaining coercive field after high temperature anneal for magnetic device applications with perpendicular magnetic anisotropy
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Application No.: US16022862Application Date: 2018-06-29
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Publication No.: US10431736B2Publication Date: 2019-10-01
- Inventor: Huanlong Liu , Yuan-Jen Lee , Jian Zhu , Guenole Jan , Luc Thomas , Po-Kang Wang , Ru-Ying Tong , Jodi Mari Iwata
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L43/12
- IPC: H01L43/12 ; H01F10/14 ; H01F10/32 ; H01F41/14 ; H01L43/08 ; H01L43/02 ; H01L43/10

Abstract:
A magnetic tunnel junction with perpendicular magnetic anisotropy (PMA MTJ) is disclosed wherein a free layer interfaces with a tunnel barrier and has a second interface with an oxide layer. A lattice-matching layer adjoins an opposite side of the oxide layer with respect to the free layer and is comprised of CoXFeYNiZLWMV or an oxide or nitride of Ru, Ta, Ti, or Si, wherein L is one of B, Zr, Nb, Hf, Mo, Cu, Cr, Mg, Ta, Ti, Au, Ag, or P, and M is one of Mo, Mg, Ta, Cr, W, or V, (x+y+z+w+v)=100 atomic %, x+y>0, and each of v and w are >0. The lattice-matching layer grows a BCC structure during annealing thereby promoting BCC structure growth in the oxide layer that results in enhanced free layer PMA and improved thermal stability.
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