Invention Grant
- Patent Title: Semiconductor device and method for controlling semiconductor device
-
Application No.: US15445751Application Date: 2017-02-28
-
Publication No.: US10432190B2Publication Date: 2019-10-01
- Inventor: Hiroshi Kono
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2016-184626 20160921
- Main IPC: H03K17/20
- IPC: H03K17/20 ; H01L23/528 ; H01L27/07 ; H01L29/16 ; H01L29/78 ; H01L29/861 ; H02M1/088 ; H02M7/5387 ; H02P27/06 ; H03K17/687 ; H03K17/74 ; H02P7/03

Abstract:
A semiconductor device comprises a first transistor with a silicon carbide layer between the source and the drain electrodes and between the gate and drain electrodes. A diode is formed in the silicon carbide layer. A forward voltage of the diode varies with the voltage applied to the gate electrode of the first transistor. A second transistor is connected to the first transistor. A gate controller applies voltages to gates of the first and second transistor such that the first and second transistors are set to an off-state a first time. The first gate voltage is then increased to an intermediate voltage that is less than a threshold voltage of the first transistor. The intermediate voltage is sufficient to alter the forward voltage of the diode and permit a forward current to flow in the diode. The first gate voltage is then increased to an on-state voltage.
Public/Granted literature
- US20180083615A1 SEMICONDUCTOR DEVICE AND METHOD FOR CONTROLLING SEMICONDUCTOR DEVICE Public/Granted day:2018-03-22
Information query