Invention Grant
- Patent Title: Additive deposition system and method
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Application No.: US15001452Application Date: 2016-01-20
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Publication No.: US10434703B2Publication Date: 2019-10-08
- Inventor: David Mathew Johnson , Victor Alfred Beck , Scott A. Elrod , David K. Biegelsen
- Applicant: Palo Alto Research Center Incorporated
- Applicant Address: US CA Palo Alto
- Assignee: PALO ALTO RESEARCH CENTER INCORPORATED
- Current Assignee: PALO ALTO RESEARCH CENTER INCORPORATED
- Current Assignee Address: US CA Palo Alto
- Agency: Miller Nash Graham & Dunn LLP
- Main IPC: G03G13/05
- IPC: G03G13/05 ; B29C64/112 ; B29C64/357 ; B33Y30/00 ; B29C64/106 ; B29C64/20 ; B33Y10/00

Abstract:
An additive deposition system and method, the system including generating an aerosol of additive material that is charged and deposited onto a selectively charged substrate. Selectively charging the substrate includes uniformly charging a surface of the substrate, selectively removing charged from the substrate to create charged and neutral regions of the substrate surface. The charged regions of the substrate having a polarity opposite a polarity of the charged aerosol. The charged aerosol of additive material deposited onto the selectively charged portions of the substrate surface due to the potential difference between the charged substrate and charged aerosol. The system and method further including repeating the additive deposition process to create a multi-layer matrix of additive material.
Public/Granted literature
- US20170203505A1 ADDITIVE DEPOSITION SYSTEM AND METHOD Public/Granted day:2017-07-20
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