Invention Grant
- Patent Title: Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle
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Application No.: US15627916Application Date: 2017-06-20
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Publication No.: US10437143B2Publication Date: 2019-10-08
- Inventor: Hwan-chul Jeon , Mun Ja Kim , Sung-won Kwon , Hee-bom Kim , Chang-young Jeong
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0039301 20170328
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/22 ; G03F1/24 ; G03F1/62 ; G03F7/20

Abstract:
Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.
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