Invention Grant
- Patent Title: Method of detaching a pellicle from a photomask
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Application No.: US15865717Application Date: 2018-01-09
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Publication No.: US10437145B2Publication Date: 2019-10-08
- Inventor: Jae-hyuck Choi , Jin-su Kim , Kyoung-mi Kim , Byung-gook Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0010030 20150121
- Main IPC: G03F1/64
- IPC: G03F1/64
Abstract:
A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores.
Public/Granted literature
- US20180136555A1 METHOD OF DETACHING A PELLICLE FROM A PHOTOMASK Public/Granted day:2018-05-17
Information query
