Invention Grant
- Patent Title: Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound
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Application No.: US15655887Application Date: 2017-07-21
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Publication No.: US10437149B2Publication Date: 2019-10-08
- Inventor: Atsuyasu Nozaki
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: SOLARIS Intellectual Property Group, PLLC
- Priority: JP2015-030739 20150219
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/039 ; C08G64/12 ; C08G18/32 ; C08G73/14 ; G03F7/095 ; B41C1/10 ; B41N1/14 ; C08G18/28 ; C08G18/73 ; C08G75/30 ; G03F7/004 ; G03F7/11
Abstract:
Provided is a photosensitive resin composition, including: a polymer compound which has a polycyclic structure and a sulfonamide group in a main chain thereof; and an infrared absorbent, wherein the polycyclic structure has at least one structure selected from the group consisting of a fused cyclic hydrocarbon structure and a fused polycyclic aromatic structure.
Public/Granted literature
Information query
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