Invention Grant
- Patent Title: Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system
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Application No.: US15711678Application Date: 2017-09-21
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Publication No.: US10437162B2Publication Date: 2019-10-08
- Inventor: David Bessems , Jon David Tedrow , Colin Michael Odneal
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.
Public/Granted literature
- US20190086817A1 METHODS AND APPARATUSES FOR PROTECTING A SEAL IN A PRESSURE VESSEL OF A PHOTOLITHOGRAPHY SYSTEM Public/Granted day:2019-03-21
Information query
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