- Patent Title: Self-centering wafer carrier system for chemical vapor deposition
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Application No.: US15178723Application Date: 2016-06-10
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Publication No.: US10438795B2Publication Date: 2019-10-08
- Inventor: Sandeep Krishnan , Alexander I. Gurary , Chenghung Paul Chang , Earl Marcelo
- Applicant: Veeco Instruments, Inc.
- Applicant Address: US NY Plainview
- Assignee: Veeco Instruments, Inc.
- Current Assignee: Veeco Instruments, Inc.
- Current Assignee Address: US NY Plainview
- Agency: Rauschenbach Patent Law Group, LLC
- Agent Kurt Rauschenbach
- Main IPC: C23C16/46
- IPC: C23C16/46 ; H01L21/02 ; H01L21/67 ; H01L21/687 ; C23C16/458 ; C23C16/455 ; H01L21/285
Abstract:
A self-centering wafer carrier system for a chemical vapor deposition (CVD) reactor includes a wafer carrier comprising an edge. The wafer carrier at least partially supports a wafer for CVD processing. A rotating tube comprises an edge that supports the wafer carrier during processing. An edge geometry of the wafer carrier and an edge geometry of the rotating tube being chosen to provide a coincident alignment of a central axis of the wafer carrier and a rotation axis of the rotating tube during process at a desired process temperature.
Public/Granted literature
- US20160372321A1 Self-Centering Wafer Carrier System For Chemical Vapor Deposition Public/Granted day:2016-12-22
Information query
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