Invention Grant
- Patent Title: Wafer processing method
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Application No.: US15819673Application Date: 2017-11-21
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Publication No.: US10438898B2Publication Date: 2019-10-08
- Inventor: Masaru Nakamura , Masamitsu Agari
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: JP2016-229963 20161128
- Main IPC: H01L21/26
- IPC: H01L21/26 ; H01L23/544 ; H01L21/268 ; H01L21/304 ; H01L21/683 ; H01L21/78 ; B24B37/04 ; H01L21/67

Abstract:
A wafer processing method for processing a wafer has a front side and a back side, the front side of the wafer being formed with a plurality of crossing streets for defining a plurality of separate regions where a plurality of devices are individually formed. The wafer processing method includes the steps of first attaching a protective tape to the front side of the wafer, next heating the protective tape and the wafer, next applying a laser beam having a transmission wavelength to the wafer to the back side of the wafer along the streets, thereby forming a modified layer inside the wafer along each street, and next grinding the back side of the wafer, thereby reducing a thickness of the wafer to a predetermined thickness and also dividing the wafer into individual chips along each street where the modified layer is formed as a division start point.
Public/Granted literature
- US20180151508A1 WAFER PROCESSING METHOD Public/Granted day:2018-05-31
Information query
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