Invention Grant
- Patent Title: Field-effect transistor and semiconductor device
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Application No.: US15772591Application Date: 2016-09-02
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Publication No.: US10438943B2Publication Date: 2019-10-08
- Inventor: Takaaki Tatsumi
- Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee Address: JP Kanagawa
- Agency: CHIP Law Group
- Priority: JP2015-221949 20151112
- International Application: PCT/JP2016/075900 WO 20160902
- International Announcement: WO2017/081916 WO 20170518
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/78 ; H01L29/66 ; H01L29/10

Abstract:
A field-effect transistor including a gate electrode provided on a first-conductivity-type region of a semiconductor substrate with an insulating film provided between the gate electrode and the first-conductivity-type region, a source region of a second conductivity type provided in the semiconductor substrate on one of sides across the gate electrode, a drain region of the second conductivity type provided in the semiconductor substrate on the other of the sides, the other side facing the one side across the gate electrode, a first region of the first conductivity type provided below the drain region and having a higher concentration than the first-conductivity-type region, a second region of the first conductivity type provided to reach a surface in the semiconductor substrate on the other side and having a higher concentration than the first-conductivity-type region, and an extraction electrode connected to the second region.
Public/Granted literature
- US20190096871A1 FIELD-EFFECT TRANSISTOR AND SEMICONDUCTOR DEVICE Public/Granted day:2019-03-28
Information query
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