Invention Grant
- Patent Title: Compact non-volatile memory device of the type with charge trapping in a dielectric interface
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Application No.: US15810979Application Date: 2017-11-13
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Publication No.: US10438960B2Publication Date: 2019-10-08
- Inventor: Francesco La Rosa , Stephan Niel , Arnaud Regnier
- Applicant: STMicroelectronics (Rousset) SAS
- Applicant Address: FR Rousset
- Assignee: STMicroelectronics (Rousset) SAS
- Current Assignee: STMicroelectronics (Rousset) SAS
- Current Assignee Address: FR Rousset
- Agency: Slater Matsil, LLP
- Priority: FR1661500 20161125
- Main IPC: H01L27/11563
- IPC: H01L27/11563 ; H01L29/423 ; H01L21/28 ; H01L27/1157 ; H01L27/11536 ; G11C16/04

Abstract:
Each memory cell is of the type with charge trapping in a dielectric interface and includes a state transistor selectable by a vertical selection transistor buried in a substrate and comprising a buried selection gate. The columns of memory cells include pairs of twin memory cells. The two selection transistors of a pair of twin memory cells have a common selection gate and the two state transistors of a pair of twin memory cells have a common control gate. The device also includes, for each pair of twin memory cells, a dielectric region situated between the control gate and the substrate and overlapping the common selection gate so as to form on either side of the selection gate the two charge-trapping dielectric interfaces respectively dedicated to the two twin memory cells.
Public/Granted literature
- US20180151584A1 COMPACT NON-VOLATILE MEMORY DEVICE OF THE TYPE WITH CHARGE TRAPPING IN A DIELECTRIC INTERFACE Public/Granted day:2018-05-31
Information query
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