Invention Grant
- Patent Title: Thin film transistors and the manufacturing methods thereof, and array substrates
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Application No.: US15542630Application Date: 2017-06-15
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Publication No.: US10439071B2Publication Date: 2019-10-08
- Inventor: Ziran Li
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- International Application: PCT/CN2017/088394 WO 20170615
- International Announcement: WO2018/184294 WO 20181011
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L29/04 ; H01L29/15 ; H01L31/036 ; H01L29/786 ; H01L29/66 ; H01L27/12 ; H01L29/49

Abstract:
The present disclosure relates to a TFT including a gate on a substrate; a gate insulation layer on the substrate and the gate, and a surface of the gate insulation layer being applied with a flattening process; an oxygen-rich layer on the gate insulation layer; an active layer on the oxygen-rich layer; a source and a drain on the active layer; and a passivation layer on the active layer, the source, and the drain. In addition, the present disclosure also relates to a manufacturing method of the TFTs and the array substrate having the TFTs. By applying the flattening process to the surface of the gate insulation layer and by forming the oxygen-rich layer on the gate insulation layer, the surface of the gate insulation layer is smooth so as to eliminate the oxygen vacancy defects on the surface of the gate insulation layer. Thus, the surface state of the gate insulation layer is stable.
Public/Granted literature
- US20180294358A1 THIN FILM TRANSISTORS AND THE MANUFACTURING METHODS THEREOF, AND ARRAY SUBSTRATES Public/Granted day:2018-10-11
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