Invention Grant
- Patent Title: Method of manufacturing optical semiconductor apparatus
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Application No.: US16196997Application Date: 2018-11-20
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Publication No.: US10439100B2Publication Date: 2019-10-08
- Inventor: Shoichi Niizeki , Hiroyasu Ichinokura
- Applicant: NIKKISO CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: NIKKISO CO., LTD.
- Current Assignee: NIKKISO CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Muncy, Geissler, Olds & Lowe, PC
- Priority: JP2016-237608 20161207
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/00 ; H01L33/32 ; H01L33/52 ; H01L33/64 ; H01L23/02 ; H01L33/48 ; H01S5/022

Abstract:
A method of manufacturing an optical semiconductor apparatus includes: placing a light transmissive lid body on a package substrate adapted to house an optical semiconductor device in an atmosphere of a first gas containing oxygen (O2), sandwiching a bonding member containing gold-tin (AuSn); exchanging an atmosphere gas for a second gas so as to reduce an oxygen concentration in the atmosphere while a load is exerted from above the lid body placed on the package substrate for temporary sealing; and heating and melting the bonding member after an exchange for the second gas is started so as to bond the package substrate and the lid body.
Public/Granted literature
- US20190088818A1 METHOD OF MANUFACTURING OPTICAL SEMICONDUCTOR APPARATUS Public/Granted day:2019-03-21
Information query
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