Invention Grant
- Patent Title: Light-emitting diode and method for manufacturing tunnel junction layer
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Application No.: US15981988Application Date: 2018-05-17
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Publication No.: US10439103B2Publication Date: 2019-10-08
- Inventor: Akira Uzawa , Noriyoshi Seo , Atsushi Matsumura , Noriyuki Aihara
- Applicant: SHOWA DENKO K. K.
- Applicant Address: JP Tokyo
- Assignee: SHOWA DENKO K. K.
- Current Assignee: SHOWA DENKO K. K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2017-103197 20170525; JP2018-017456 20180202
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/00 ; H01L33/30 ; H01L33/40 ; H01L33/04 ; H01L33/08

Abstract:
A light-emitting element layer 10 includes: an n-type contact layer 11; a first light-emitting layer 12; a tunnel junction layer 13; a second light-emitting layer 14; and a p-type contact layer 15 laminated in this order. The first light-emitting layer 12 and the second light-emitting layer 14 emit light of the same wavelength. The tunnel junction layer 13 includes: a p-type tunnel layer 131 made of AlGaAs containing p-type impurities (C); and an n-type tunnel layer 133 made of GaInP containing n-type impurities (Te). A highly n-type impurities-doped layer 132 having a higher concentration of n-type impurities than the n-type tunnel layer 133 is arranged between the p-type tunnel layer 131 and the n-type tunnel layer 133.
Public/Granted literature
- US20180342646A1 LIGHT-EMITTING DIODE AND METHOD FOR MANUFACTURING TUNNEL JUNCTION LAYER Public/Granted day:2018-11-29
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