Invention Grant
- Patent Title: Method for producing deposition mask
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Application No.: US15750616Application Date: 2017-08-31
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Publication No.: US10439138B2Publication Date: 2019-10-08
- Inventor: Katsuhiko Kishimoto , Susumu Sakio
- Applicant: Sakai Display Products Corporation
- Applicant Address: JP Osaka
- Assignee: Sakai Display Products Corporation
- Current Assignee: Sakai Display Products Corporation
- Current Assignee Address: JP Osaka
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- International Application: PCT/JP2017/031346 WO 20170831
- International Announcement: WO2019/043866 WO 20190307
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/56 ; C23C14/04 ; B23K11/11 ; H01L27/32 ; B23K26/08 ; B23K26/22 ; B23K26/0622 ; B23K101/36 ; B23K103/18

Abstract:
A step of forming openings in a mask substrate includes step A of forming openings of “a” number of continual columns included in a first region (R1) including at least the (n/2)th column or the ((n+1)/2)th column; step B of forming openings of “b” number of continual columns included in a second region (R2) adjacent to the first region (R1) in a −x direction with a first gap region (RS1) being sandwiched between the first and second regions, the first gap region including “sa” number of continual columns; and step C of forming openings of “c” number of continual columns included in a third region (R3) adjacent to the first region (R1) in an x direction with a second gap region (RS2) being sandwiched between the first and third regions, the second gap region including “sb” number of continual columns. The steps B and C are performed after the step A.
Public/Granted literature
- US20190067578A1 METHOD FOR PRODUCING DEPOSITION MASK Public/Granted day:2019-02-28
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