A fan-out structure and its manufacturing method are presented, relating to semiconductor techniques. The fan-out structure includes a welding pad; a welding pad extension member contacting the welding pad; and a fan-out line contacting the welding pad extension member, with an elicitation direction of the fan-out line perpendicular to an extension direction of the welding pad. This fan-out structure allows the fan-out line to be horizontally or vertically elicited from the welding pad, and thus remedies the drawbacks associated with an aslant-elicited fan-out line in conventional fan-out structures.