Invention Grant
- Patent Title: Method for forming a lateral super-junction MOSFET device and termination structure
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Application No.: US16262695Application Date: 2019-01-30
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Publication No.: US10446679B2Publication Date: 2019-10-15
- Inventor: Madhur Bobde , Lingpeng Guan , Karthik Padmanabhan , Hamza Yilmaz
- Applicant: Alpha and Omega Semiconductor Incorporated
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee: Alpha and Omega Semiconductor Incorporated
- Current Assignee Address: US CA Sunnyvale
- Agency: Patent Law Works LLP
- Main IPC: H01L21/84
- IPC: H01L21/84 ; H01L29/78 ; H01L29/10 ; H01L29/08 ; H01L29/06 ; H01L29/40 ; H01L29/417 ; H01L29/66

Abstract:
A method for forming a lateral superjunction MOSFET device includes forming a semiconductor body including a lateral superjunction structure and a first column connected to the lateral superjunction structure. The MOSFET device includes the first column to receive current from the channel when the MOSFET is turned on and to distribute the channel current to the lateral superjunction structure functioning as the drain drift region. In some embodiment, the MOSFET device includes a second column disposed in close proximity to the first column. The second column disposed near the first column is used to pinch off the first column when the MOSFET device is to be turned off and to block the high voltage being sustained by the MOSFET device at the drain terminal from reaching the gate structure. In some embodiments, the MOSFET device further includes termination structures for the drain, source and body contact doped region fingers.
Public/Granted literature
- US20190165169A1 METHOD FOR FORMING A LATERAL SUPER-JUNCTION MOSFET DEVICE AND TERMINATION STRUCTURE Public/Granted day:2019-05-30
Information query
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