Invention Grant
- Patent Title: Lithographic method and apparatus
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Application No.: US15527254Application Date: 2015-11-30
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Publication No.: US10451977B2Publication Date: 2019-10-22
- Inventor: Nick Kant , Nico Vanroose , Johannes Jacobus Matheus Baselmans
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14195783 20141202; EP15186673 20150924; EP15196964 20151130
- International Application: PCT/EP2015/078096 WO 20151130
- International Announcement: WO2016/087388 WO 20160609
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01M11/02
Abstract:
A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.
Public/Granted literature
- US20170357159A1 LITHOGRAPHIC METHOD AND APPARATUS Public/Granted day:2017-12-14
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