Invention Grant
- Patent Title: Semiconductor device and method of forming double-sided fan-out wafer level package
-
Application No.: US14814906Application Date: 2015-07-31
-
Publication No.: US10453785B2Publication Date: 2019-10-22
- Inventor: Il Kwon Shim , Pandi C. Marimuthu , Won Kyoung Choi , Sze Ping Goh , Jose A. Caparas
- Applicant: STATS ChipPAC, Ltd.
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee: STATS ChipPAC Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins and Associates, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L21/56 ; H01L23/31 ; H01L23/00 ; H01L25/10 ; H01L23/538

Abstract:
A semiconductor device comprises a first semiconductor package including a conductive layer. A substrate including an interconnect structure is disposed over the conductive layer. The interconnect structure of the substrate with the conductive layer of the first semiconductor package are self-aligned. A plurality of openings is formed in the substrate. An adhesive is disposed between the substrate and the first semiconductor package and in the openings of the substrate. A redistribution layer (RDL) is formed over the first semiconductor package opposite the substrate. A pitch of the substrate is different from a pitch of the RDL. The adhesive extends to the interconnect structure of the substrate. A second semiconductor package is disposed over the substrate and the first semiconductor package.
Public/Granted literature
- US20160043047A1 Semiconductor Device and Method of Forming Double-Sided Fan-Out Wafer Level Package Public/Granted day:2016-02-11
Information query
IPC分类: