Invention Grant
- Patent Title: Semiconductor pressure sensor
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Application No.: US16135017Application Date: 2018-09-19
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Publication No.: US10454017B2Publication Date: 2019-10-22
- Inventor: Kimitoshi Sato
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2018-038830 20180305
- Main IPC: H01L41/113
- IPC: H01L41/113 ; H01L41/08 ; H01L41/053 ; B81B3/00

Abstract:
A semiconductor pressure sensor includes: a first semiconductor substrate having a surface; an oxide film provided on the surface of the first semiconductor substrate and having a cavity; a second semiconductor substrate bonded to the first semiconductor substrate via the oxide film and having a diaphragm above the cavity; and a piezoelectric device provided on the diaphragm, wherein no recess is provided in the surface of the first semiconductor substrate within a region of the diaphragm, and a stress mitigating groove is provided in the oxide film outside and around the diaphragm.
Public/Granted literature
- US20190273200A1 SEMICONDUCTOR PRESSURE SENSOR Public/Granted day:2019-09-05
Information query
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