Disclosed a substrate liquid processing apparatus including: a liquid processing section configured to process a substrate with a processing liquid; a processing liquid supply section configured to supply the processing liquid; a diluent supply section configured to supply a diluent for diluting the processing liquid; a controller configured to control the diluent supply section; a concentration detection unit configured to detect a concentration of the processing liquid; and an atmospheric pressure detection unit configured to detect an atmospheric pressure. The controller acquires the concentration of the processing liquid from the concentration detection unit and the atmospheric pressure from the atmospheric pressure detection unit, controls an amount of the diluent supplied from the diluent supply section such that the acquired concentration of the processing liquid becomes a previously set concentration (“set concentration”), and corrects the set concentration according to the acquired atmospheric pressure.