Invention Grant
- Patent Title: Method for inspecting substrate, substrate inspection apparatus, exposure system, and method for producing semiconductor device
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Application No.: US13291279Application Date: 2011-11-08
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Publication No.: US10460998B2Publication Date: 2019-10-29
- Inventor: Yoshihiko Fujimori
- Applicant: Yoshihiko Fujimori
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2010-250428 20101109; JP2011-040925 20110225
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01N21/956

Abstract:
There is provided a method for inspecting a substrate including: irradiating an illumination light onto a first surface or a second surface opposite to the first surface, of a substrate in which a pattern having a periodicity and extending from the first surface to an inside of the substrate is formed in the first surface, the illumination light having a permeability to permeate the substrate to a predetermined depth; detecting a light reflected from or transmitted through the substrate due to irradiation of the illumination light; and inspecting the substrate by utilizing information based on the periodicity of the pattern obtained from detection of the light reflected from or transmitted through the substrate.
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Information query
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