Invention Grant
- Patent Title: Variable resistance memory device and method of manufacturing the same
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Application No.: US15864388Application Date: 2018-01-08
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Publication No.: US10461127B2Publication Date: 2019-10-29
- Inventor: Jong-chul Park
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2017-0084407 20170703
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00 ; G11C13/00

Abstract:
A variable resistance memory device including a first conductive line extending in a first direction on a substrate, a second conductive line on the first conductive line and extending in a second direction crossing the first direction, and a memory cell pillar connected to the first conductive line and the second conductive line at a crossing point therebetween and including a heating electrode layer and a variable resistance layer in contact with the heating electrode layer such that both sidewalls of the heating electrode layer are aligned with both sidewalls of the first conductive line in the first direction.
Public/Granted literature
- US20190006422A1 VARIABLE RESISTANCE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-01-03
Information query
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