The invention pertains to a process for producing an array (1) of mesa-structured photodiodes (2), including at least the following steps:a) producing a useful layer (3);b) producing an etch mask formed of a plurality of etch pads (20);c) wet-etching part of the useful layer (3) located between the etch pads (20), forming a plurality of mesa-structured photodiodes (2), producing a recess (21);d) conformally depositing a passivation layer (14);e) removing the etch pads (20) by chemical dissolution;f) producing conductive pads (11).