Invention Grant
- Patent Title: Silk water lithography
-
Application No.: US14776236Application Date: 2014-03-14
-
Publication No.: US10464361B2Publication Date: 2019-11-05
- Inventor: Fiorenzo G. Omenetto , David L. Kaplan , Miaomiao Yang , Hu Tao , Benedetto Marelli , Sunghwan Kim
- Applicant: TUFTS UNIVERSITY
- Applicant Address: US MA Medford
- Assignee: Tufts University
- Current Assignee: Tufts University
- Current Assignee Address: US MA Medford
- Agency: Quarles & Brady LLP
- Agent James M. Schleicher
- International Application: PCT/US2014/029598 WO 20140314
- International Announcement: WO2014/144971 WO 20140918
- Main IPC: B41M5/00
- IPC: B41M5/00
Abstract:
The present invention provides compositions and methods for printing a predetermined pattern on silk fibroin materials using water based “inks.” Such technique may be useful for micro- and nano-engineering applications.
Public/Granted literature
- US20160046138A1 SILK WATER LITHOGRAPHY Public/Granted day:2016-02-18
Information query
