Invention Grant
- Patent Title: Pellicle and pellicle assembly
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Application No.: US16062017Application Date: 2016-12-02
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Publication No.: US10466585B2Publication Date: 2019-11-05
- Inventor: David Ferdinand Vles , Erik Achilles Abegg , Aage Bendiksen , Derk Servatius Gertruda Brouns , Pradeep K. Govil , Paul Janssen , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , James Norman Wiley
- Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP15200767 20151217
- International Application: PCT/EP2016/079599 WO 20161202
- International Announcement: WO2017/102380 WO 20170622
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F1/64 ; G03F1/22 ; G03F1/62 ; G03F7/20
Abstract:
A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
Public/Granted literature
- US20180364561A1 PELLICLE AND PELLICLE ASSEMBLY Public/Granted day:2018-12-20
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