Invention Grant
- Patent Title: Plasma device with an external RF hollow cathode for plasma cleaning of high vacuum systems
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Application No.: US15612232Application Date: 2017-06-02
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Publication No.: US10468236B2Publication Date: 2019-11-05
- Inventor: Ronald A. Vane
- Applicant: XEI Scientific, Inc.
- Applicant Address: US CA Redwood City
- Assignee: XEI Scienctific, Inc.
- Current Assignee: XEI Scienctific, Inc.
- Current Assignee Address: US CA Redwood City
- Agent Mark D. Perdue
- Main IPC: H01J37/32
- IPC: H01J37/32 ; B08B7/00 ; B08B9/08

Abstract:
A compact cylindrical vacuum chamber made from a dielectric ceramic or glass wrapped with a cylindrical electrode connected to an RF source make a hollow cathode RF plasma source. The dielectric cylinder is used as the vacuum container with the conductive electrode outside the vacuum region to excite plasma inside. A gas is supplied by a gas source at low flow on one end of the cylinder and after being excited exhausts into a connected vacuum chamber carrying excited metastables and radicals. RF power is applied to the electrode to excite the plasma via the hollow cathode effect. This remote RF plasma source can be used to create ions, electrons, excited metastables, and atomic radicals for use downstream depending on choices of gas, pressure, flow rates, RF power and frequency, and extraction electrodes.
Public/Granted literature
- US20180350564A1 Plasma Device with an External RF Hollow Cathode for Plasma Cleaning of High Vacuum Systems Public/Granted day:2018-12-06
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