Examples described herein include apparatuses and methods TSV resistance and short measurement in a stacked device. An example apparatus may include a chip comprising semiconductor substrate including a first surface and a second surface opposite to the first surface. The chip may include a first terminal formed above the first surface, a second terminal formed above the second surface, a buffer circuit coupled between the first and second terminals, a first through-substrate via (TSV) penetrating the semiconductor substrate, and a first switch coupled between the first terminal and the first TSV.