Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US15702084Application Date: 2017-09-12
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Publication No.: US10468334B2Publication Date: 2019-11-05
- Inventor: Ippei Kume , Kazuhiko Nakamura , Yuki Noda
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2017-053588 20170317
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/3065 ; H01L21/768 ; H01L23/528 ; H01L29/06 ; H01L21/311 ; H01L23/532 ; H01L23/00

Abstract:
A semiconductor device according to an embodiment includes a semiconductor substrate including a first face having semiconductor elements, and a second face on an opposite side to the first face. A first insulating film is located on the first face of the semiconductor substrate. A conductor is located on the first insulating film. A metal electrode is located between the first face and the second face and passes through the semiconductor substrate to be in contact with the conductor. A second insulating film is located between the metal electrode and the semiconductor substrate. A boundary face between the first insulating film and the second insulating film is located on a side of the conductor relative to the first face of the semiconductor substrate and is inclined to approach the conductor toward a center portion of the metal electrode.
Public/Granted literature
- US20180269133A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-09-20
Information query
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