Invention Grant
- Patent Title: Transistor device and semiconductor layout structure
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Application No.: US15808395Application Date: 2017-11-09
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Publication No.: US10468490B2Publication Date: 2019-11-05
- Inventor: Jei-Cheng Huang , Jhen-Yu Tsai
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/78 ; H01L27/02

Abstract:
The present disclosure provides a transistor device and a semiconductor layout structure. The transistor device includes a substrate including at least one active region, an isolation structure surrounding the active region, a gate structure disposed over the substrate, and a source/drain region disposed at two opposite sides of the gate structure. The gate structure includes a first portion extending along a first direction and a second portion extending along a second direction perpendicular to the first direction. The first portion of the gate structure overlaps a first boundary between the active region and the isolation structure.
Public/Granted literature
- US20190140096A1 TRANSISTOR DEVICE AND SEMICONDUCTOR LAYOUT STRUCTURE Public/Granted day:2019-05-09
Information query
IPC分类: